| Addition polymerization of norbornene-type monomers using neutral nickel complexes containing fluorinated aryl ligands DA Barnes, GM Benedikt, BL Goodall, SS Huang, HA Kalamarides, ... Macromolecules 36 (8), 2623-2632, 2003 | 196 | 2003 |
| Functionalized polynorbornene dielectric polymers: adhesion and mechanical properties NR Grove, PA Kohl, SA Bidstrup Allen, S Jayaraman, R Shick Journal of Polymer Science Part B: Polymer Physics 37 (21), 3003-3010, 1999 | 185 | 1999 |
| Addition polymerization of norbornene-type monomers. High activity cationic allyl palladium catalysts J Lipian, RA Mimna, JC Fondran, D Yandulov, RA Shick, BL Goodall, ... Macromolecules 35 (24), 8969-8977, 2002 | 143 | 2002 |
| Low k, Porous Methyl Silsesquioxane and Spin‐On‐Glass AT Kohl, R Mimna, R Shick, L Rhodes, ZL Wang, PA Kohl Electrochemical and solid-state letters 2 (2), 77, 1998 | 134 | 1998 |
| Synthesis and nonlinear-optical properties of vinyl-addition poly (norbornene) s KH Park, RJ Twieg, R Ravikiran, LF Rhodes, RA Shick, D Yankelevich, ... Macromolecules 37 (14), 5163-5178, 2004 | 104 | 2004 |
| Air-gaps in 0.3 μm electrical interconnections PA Kohl, DM Bhusari, M Wedlake, C Case, FP Klemens, J Miner, BC Lee, ... IEEE Electron Device Letters 21 (12), 557-559, 2000 | 82 | 2000 |
| Adsorption behavior of a silane coupling agent on colloidal silica studied by gel permeation chromatography N Nishiyama, R Shick, H Ishida Journal of colloid and interface science 143 (1), 146-156, 1991 | 79 | 1991 |
| Air‐Gaps for Electrical Interconnections PA Kohl, Q Zhao, K Patel, D Schmidt, SA Bidstrup-Allen, R Shick, ... Electrochemical and Solid-State Letters 1 (1), 49, 1998 | 77 | 1998 |
| Protecting groups for 193-nm photoresists RD Allen, R Sooriyakumaran, J Opitz, GM Wallraff, RA Di Pietro, G Breyta, ... Advances in Resist Technology and Processing XIII 2724, 334-343, 1996 | 75 | 1996 |
| Photoresist compositions comprising polycyclic polymers with acid labile pendant groups BL Goodall, S Jayaraman, RA Shick, LF Rhodes US Patent 6,136,499, 2000 | 74 | 2000 |
| Photoresist compositions comprising polycyclic polymers with acid labile pendant groups LF Rhodes, A Bell, S Jayaraman, JH Lipian, BL Goodall, RA Shick US Patent 6,232,417, 2001 | 66 | 2001 |
| Crosslinking and decomposition reactions of epoxide functionalized polynorbornene. Part I. FTIR and thermogravimetric analysis P Chiniwalla, Y Bai, E Elce, R Shick, WC McDougall, SAB Allen, PA Kohl Journal of applied polymer science 89 (2), 568-577, 2003 | 64 | 2003 |
| Photoresist compositions comprising polycyclic polymers with acid labile pendant groups BL Goodall, S Jayaraman, RA Shick, LF Rhodes US Patent 6,790,579, 2004 | 61 | 2004 |
| Addition polymers of polycycloolefins containing silyl functional groups LH McIntosh III, BL Goodall, RA Shick, S Jayaraman US Patent 5,912,313, 1999 | 52 | 1999 |
| Fabrication of microchannels using polynorbornene photosensitive sacrificial materials X Wu, HA Reed, Y Wang, LF Rhodes, E Elce, R Ravikiran, RA Shick, ... Journal of the Electrochemical Society 150 (9), H205, 2003 | 48 | 2003 |
| Reactive ion etching of 193-nm resist candidates: current platforms and future requirements TI Wallow, PJ Brock, RA Di Pietro, RD Allen, J Opitz, R Sooriyakumaran, ... Advances in Resist Technology and Processing XV 3333, 92-101, 1998 | 47 | 1998 |
| Photoresist compositions comprising polycyclic polymers with acid labile pendant groups BL Goodall, S Jayaraman, RA Shick, LF Rhodes, RD Allen, RA DiPietro, ... US Patent 6,723,486, 2004 | 43 | 2004 |
| Theoretical development for depth profiling of stratified layers using variable-angle ATR RA Shick, JL Koenig, H Ishida Applied spectroscopy 47 (8), 1237-1244, 1993 | 40 | 1993 |
| Photosensitive polynorbornene based dielectric. I. Structure–property relationships Y Bai, P Chiniwalla, E Elce, RA Shick, J Sperk, SAB Allen, PA Kohl Journal of applied polymer science 91 (5), 3023-3030, 2004 | 38 | 2004 |
| Optical waveguides and methods for making the same XM Zhao, R Ravikiran, PS Neal, RA Shick, JE Watson, TM Kafka, D Chum, ... US Patent 6,677,175, 2004 | 32 | 2004 |
